InterLitho Technology Limited

Large-area Nanopatterning Equipment will develop fiber-optic multi-beam interference lithography nanopatterning systems that can create periodic one-dimensional gratings and two dimensional pillar or hole arrays with sub-100 nm feature sizes and down to 250 nm periods over wafer-scale area with 4-inch or larger diameter.
Image-based Plasmonic Sensors using gradient plasmonic nanostructures for biomedical applications and gas sensing applications for environmental quality monitoring.